Industry Research Report On Thin Film Metrology Systems: Innovations & Competitive Analysis
- Anna Sibley
- Jul 20, 2021
- 2 min read
Thin Film Metrology Systems Market – Introduction
Thin film metrology systems are used to measure different types of the film thickness accurately such as such as resistivity, thickness, and stress among others. Across the globe, a rising application scope in the measurement of thin film parameters is expected to accelerate the growth of market for thin film metrology systems in coming years. Moreover, the increasing demand for miniaturization and integration of electronics components is anticipated to add remarkably to the growth of the global thin film metrology systems market during the forecast period. Further, thin film metrology involves the use of these mathematical calculations to the thickness and presence of different types of coatings which have been placed on a substrate material with the help of variety of processes.
In addition to this, there are numerous technologies are used to measure the film thickness which include spectroscopic reflectrometry, ellipsometry, profilometry, and X-ray analysis among others. However, these types of measurement systems are ideal choice for the semiconductor manufacturers. This is mainly due to, these technologies play an important role in the manufacturing of different telecommunication and consumer electronics equipment such as advanced memory chip devices, transistors, motherboards, and others semiconductor devices.
Thin Film Metrology Systems Market – Competitive Landscape
In February 2018, Nanometrics Incorporated, a leading provider of advanced process control solutions, today announced that a domestic China 3D-NAND manufacturer has selected Nanometrics for fab-wide process control.
In August 2018, Rudolph Technologies announced that they have introduced second-generation dragonfly inspection and metrology system for advanced packaging. The company is expected that this new system increases the options for advanced packaging customers to meet their wafer-based application challenges on a single platform.
KLA Tencor
Founded in 1997, KLA Tencor is headquartered in Milpitas, California, United States. The American technology company is involved in the designing and manufacturing of specializing in process control and yield management systems for the semiconductor industry and other related Nano electronics industries. It has more than 10,000 employees across the globe and the company has dedicated customer operations and service centers around the world.
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Rudolph Technologies
Rudolph Technologies, Inc., Headquartered in Wilmington, Massachusetts, is one of the leading in the designer, manufacturers and suppliers of defect inspection, process control metrology, lithography, and process control software, which are used by and advanced packaging device manufacturers across the globe. The company is operating their sales & distribution network across the different part of the globe.
Nanometrics Incorporated
Established in 1975, Nanometrics Incorporated is a leading provides advanced, high-performance inspection solutions and process control metrology, which are used primarily across different semiconductor manufacturing industry. It involves in the research and development of solutions and appliances geared towards bettering the lives of end users.
Nova Measuring Instruments
Founded in 1993, one of the leading manufacturer of advanced metrology solutions for the semiconductor manufacturing industry. The group has been involved in measurement technology for more than 20 years. The company has offices in Taiwan, Korea, Singapore, China, United States, Japan and Europe. Further, the company had dedicated customer operations and service centers around the world.
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